Dr. Koji Kikuchi,
Sony Corporation

Koji Kikuchi received the B.E. and M.E. degrees of material science and engineering from Nagoya University , Aichi prefecture, Japan , in 1995 and 1997, respectively. He joined Sony Corporation in 1998 and has been working on research of the advanced photolithography process for below 0.18 micron node. Especially, he focused on developing resolution enhancement techniques, such as a phase shifting mask technology, an annular illumination and optical proximity effect corrections. From the view point of the lithography process margin and device characteristics, he successfully optimized these techniques and applied them to mass production of graphic chips in Play Station II. Layers required fine patterning could be engraved with enough depth of focus and exposure latitude by his outputs. Some of these results were presented at SPIE annual international 2000 symposium, Photomask Japan 2001 and EIPBN 2001.

            Since 2003, his work was expanded into other semiconductor business categories: CCD and CMOS image sensors. Since 2004, Dr. Kikichi has involved in optical simulations for CCD and CMOS image sensors and is currently studying electromagnetic waves in image sensors to estimate its impact to the device characteristics.